Doping is the process of adding some impurity atoms in the semiconductor. These impurity atoms are known as dopants .After addition of these dopants some of the properties of the conductors can be changed according to our necessity.
Some basic doping techniques:
→First we have to heat up the semiconductor crystal. The heating must be at the place where the dopants are present in the atmosphere. After heating the diffusion of the dopants occur in the lattice site of the crystal.
→In the second method of doping , the semiconductor is bombarded with the ions of the semiconductor itself. Then the dopants were embedded.
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